Objective The objective of the project is to produce a photomask linewidth calibration standard covering the dimensional range 0.20 um up to 50 um, with a 95% confidence level uncertainty in the calibration of lines of at least +/- 0.02 um in the 0.2 um up to 10 um range, and of at least +/- 0.05 um in the 10 um to 50 um range. The standard, to be fabricated in high density chromium (optical density greater than 2.5 at 450 nm) on a fused quartz plate coated with a conducting layer, is to be suitable for use in both optical and electron beam systems. Initially, ten artefacts will be manufactured, three of these being calibrated and retained by the Commission, the National Physical Laboratory (NPL) and the Physikalisch-Technische Bundesanstalt (PTB). Status: The work is in progress. Fields of science natural scienceschemical sciencesinorganic chemistrytransition metals Programme(s) FP2-BCR 4 - Research and development programme (EEC) in the field of applied metrology and chemical analysis (Community Bureau of Reference - BCR), 1988-1992 Topic(s) Data not available Call for proposal Data not available Funding Scheme CSC - Cost-sharing contracts Coordinator National Physical Laboratory (NPL) EU contribution No data Address Queen's Road TW11 0LW Teddington United Kingdom See on map Total cost No data Participants (4) Sort alphabetically Sort by EU Contribution Expand all Collapse all Dupont Photomask SA France EU contribution No data Address Rue Olivier Perroy 13790 Rousset See on map Total cost No data National Microelectronics Research Center Ireland EU contribution No data Address See on map Total cost No data PHYSIKALISCH-TECHNISCHE BUNDESANSTALT Germany EU contribution No data Address Bundesallee 100 BRAUNSCHWEIG See on map Links Website Opens in new window Total cost No data Rutherford Appleton Laboratory (RAL) United Kingdom EU contribution No data Address Chilton OX11 0QX Didcot See on map Total cost No data
