Objectif Objectives and content There is a clear industrial need for the development of hard, wear resistant coatings which are chemically inert and which can be deposited at low temperatures (< = 500°C) via an environmentally friendly process. All these criteria can be satisfied in principle, by the growth of alpha alumina (Al203) utilising plasma enhanced processes. However, this has not yet been achieved by any laboratory in the world. The aim of the present proposal is to identify the conditions under which the (hard) AI203 phase can be grown at low temperatures and hence to implement the growth of this phase using PVD techniques of the type that are available commercially. To this end, we shall utilise two different, but complementary, deposition growth techniques viz plasma enhanced deposition and molecular beam epitaxy (MBE). The former technique has been used by one of the partners (Linköping University), in the low temperature growth of high quality SiC. The MBE technique, with which another of the partners (the University of Hull) has extensive experience for the growth of compound semiconductors, provides a powerful investigative tool, for the study of basic growth processes. These investigations, carried out b.,v both groups, will proceed from 'ideal' substrates (e.g. sapphire) to the more complex ones of relevance to industry (e.g. alloy steels). The growth investigations will be supplemented strongly by state-of-the-art characterisation techniques at the Universita degli Studi di Ancona and Linköping University (e.g. XRD, TEM) and by theoretical modelling at the University of Hull. These will help to identify the range of conditions for the realisation of growth of &-Al203 on a given substrate. For example modelling can help identify the range of compositions under which a given alloy is stable, or the temperature range for ideal growth to occur. Modelling can also investigate the influence of energetic surface species on the stability and growth of a given layer. Thus the characterisation and theoretical modelling groups will act not only as facilitators for knowledge transfer between the two growth programmes, but will also be actively participating in both areas of investigation. In this manner we aim to enable the technology transfer to be made by which &-AI203 can be grown by PVD at low temperatures. To this end the programme is supported by user companies, SECO and Tixon, and by an industrial research laboratory, Instituto Reserche Breda, who will carry out mechanical evaluations of the coatings. Champ scientifique engineering and technologymaterials engineeringcoating and filmsnatural sciencesphysical scienceselectromagnetism and electronicssemiconductivity Programme(s) FP4-BRITE/EURAM 3 - Specific research and technological development programme in the field of industrial and materials technologies, 1994-1998 Thème(s) 0201 - Materials engineering Appel à propositions Data not available Régime de financement CSC - Cost-sharing contracts Coordinateur University of Hull Contribution de l’UE Aucune donnée Adresse Cottingham Road HU6 7RX Hull Royaume-Uni Voir sur la carte Coût total Aucune donnée Participants (5) Trier par ordre alphabétique Trier par contribution de l’UE Tout développer Tout réduire ITALIAN INSTITUTE FOR THE PHYSICS OF MATTER Italie Contribution de l’UE Aucune donnée Adresse Via Ranieri 65, Istituto di Scienze Fisiche 60131 ANCONA Voir sur la carte Coût total Aucune donnée Istituto Scientifico Breda SpA Italie Contribution de l’UE Aucune donnée Adresse Viale Sarca 336 20126 Milano Voir sur la carte Coût total Aucune donnée LINKOEPING UNIVERSITY Suède Contribution de l’UE Aucune donnée Adresse 23,Valla 58183 LINKOEPING Voir sur la carte Coût total Aucune donnée Seco Tools AB Suède Contribution de l’UE Aucune donnée Adresse 737 82 Fagersta Voir sur la carte Coût total Aucune donnée Tixon AB Suède Contribution de l’UE Aucune donnée Adresse 2,Svedengatan 582 73 Linkoping Voir sur la carte Coût total Aucune donnée