Obiettivo Objectives and content There is a clear industrial need for the development of hard, wear resistant coatings which are chemically inert and which can be deposited at low temperatures (< = 500°C) via an environmentally friendly process. All these criteria can be satisfied in principle, by the growth of alpha alumina (Al203) utilising plasma enhanced processes. However, this has not yet been achieved by any laboratory in the world. The aim of the present proposal is to identify the conditions under which the (hard) AI203 phase can be grown at low temperatures and hence to implement the growth of this phase using PVD techniques of the type that are available commercially. To this end, we shall utilise two different, but complementary, deposition growth techniques viz plasma enhanced deposition and molecular beam epitaxy (MBE). The former technique has been used by one of the partners (Linköping University), in the low temperature growth of high quality SiC. The MBE technique, with which another of the partners (the University of Hull) has extensive experience for the growth of compound semiconductors, provides a powerful investigative tool, for the study of basic growth processes. These investigations, carried out b.,v both groups, will proceed from 'ideal' substrates (e.g. sapphire) to the more complex ones of relevance to industry (e.g. alloy steels). The growth investigations will be supplemented strongly by state-of-the-art characterisation techniques at the Universita degli Studi di Ancona and Linköping University (e.g. XRD, TEM) and by theoretical modelling at the University of Hull. These will help to identify the range of conditions for the realisation of growth of &-Al203 on a given substrate. For example modelling can help identify the range of compositions under which a given alloy is stable, or the temperature range for ideal growth to occur. Modelling can also investigate the influence of energetic surface species on the stability and growth of a given layer. Thus the characterisation and theoretical modelling groups will act not only as facilitators for knowledge transfer between the two growth programmes, but will also be actively participating in both areas of investigation. In this manner we aim to enable the technology transfer to be made by which &-AI203 can be grown by PVD at low temperatures. To this end the programme is supported by user companies, SECO and Tixon, and by an industrial research laboratory, Instituto Reserche Breda, who will carry out mechanical evaluations of the coatings. Campo scientifico engineering and technologymaterials engineeringcoating and filmsnatural sciencesphysical scienceselectromagnetism and electronicssemiconductivity Programma(i) FP4-BRITE/EURAM 3 - Specific research and technological development programme in the field of industrial and materials technologies, 1994-1998 Argomento(i) 0201 - Materials engineering Invito a presentare proposte Data not available Meccanismo di finanziamento CSC - Cost-sharing contracts Coordinatore University of Hull Contributo UE Nessun dato Indirizzo Cottingham Road HU6 7RX Hull Regno Unito Mostra sulla mappa Costo totale Nessun dato Partecipanti (5) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto ITALIAN INSTITUTE FOR THE PHYSICS OF MATTER Italia Contributo UE Nessun dato Indirizzo Via Ranieri 65, Istituto di Scienze Fisiche 60131 ANCONA Mostra sulla mappa Costo totale Nessun dato Istituto Scientifico Breda SpA Italia Contributo UE Nessun dato Indirizzo Viale Sarca 336 20126 Milano Mostra sulla mappa Costo totale Nessun dato LINKOEPING UNIVERSITY Svezia Contributo UE Nessun dato Indirizzo 23,Valla 58183 LINKOEPING Mostra sulla mappa Costo totale Nessun dato Seco Tools AB Svezia Contributo UE Nessun dato Indirizzo 737 82 Fagersta Mostra sulla mappa Costo totale Nessun dato Tixon AB Svezia Contributo UE Nessun dato Indirizzo 2,Svedengatan 582 73 Linkoping Mostra sulla mappa Costo totale Nessun dato