Objetivo - Availability of prototype processing capability in industrial pilot lines by 1996 of a true 0.35 micron CMOS, 3-4 metal, 3.3V process based on the next generation of lithographic tools offering process capability for complex products requiring high density of integration (10K gates/mm{2}) and high performances (> 0.5 mA/micron for NMOS and > 0.25 mA/micron for PMOS) with reduced power consumption. - Process specifications and target design rules will be agreed with major end-users with reference to key applications.- The 0.35 micron base process will be designed to provide also the base-line for further process developments such as analogue addressing specific markets and for an extension later to BICMOS.SHAPE is concerned with development of the next generation of 0.35 micron CMOS logic technology. The new technology will be demonstrated by processing innovative VLSI circuits designed in cooperation with major European end-users. The project contains a first phase aiming at implementation and characterisation of process steps, followed by integration of a full CMOS process, targeting the most advanced performances needed by the semiconductor market. At a very early stage, design rules and processing capabilities will be offered to selected users in order to allow advanced system developments in Europe. The developments provide the opportunity for a close and focused cooperation among European semiconductor companies, electronic equipment manufacturers and research institutes to establish in Europe, within a competitive time frame, an early sub-half-micron processing and design capability. Ámbito científico natural sciencesphysical scienceselectromagnetism and electronicssemiconductivity Programa(s) FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998 Tema(s) 2.12 - Semiconductors-Enhancement of technology & manufacturing base Convocatoria de propuestas Data not available Régimen de financiación CSC - Cost-sharing contracts Coordinador Sgs-Thomson Microelectronics Sa Aportación de la UE Sin datos Dirección Avenue Gallieni 7 94253 Gentilly Francia Ver en el mapa Coste total Sin datos Participantes (6) Ordenar alfabéticamente Ordenar por aportación de la UE Ampliar todo Contraer todo Austria Mikro Systeme International Ag Austria Aportación de la UE Sin datos Dirección Schloss Premstatten 8141 Unterpremstatten Ver en el mapa Coste total Sin datos GEC Plessey Semiconductors plc Reino Unido Aportación de la UE Sin datos Dirección Cheney Manor SN2 2QW Swindon Ver en el mapa Coste total Sin datos Matra Mhs Francia Aportación de la UE Sin datos Dirección Route De Gachet 44087 Nantes Ver en el mapa Coste total Sin datos Mietec N.V. Bélgica Aportación de la UE Sin datos Dirección Westerring 15 9700 Oudenaarde Ver en el mapa Coste total Sin datos Philips International Países Bajos Aportación de la UE Sin datos Dirección Gerstweg 2 6534 AE Nijmegen Ver en el mapa Coste total Sin datos Siemens Ag Alemania Aportación de la UE Sin datos Dirección Wittelsbacher Platz 2 D-80333 Munich Ver en el mapa Coste total Sin datos
