Objective - To integrate and evaluate the SD 4000 in a vertical furnace process cell of a high volume 4 Mb, 0.8 micron process line.- To prove its versatility, accuracy and cost effectiveness for measuring a range of thin, single and multiple films.- The layers to be evaluated include single layers in the range 4 nm - 1000 nm, multiple layers of ONO, OPO and monitoring of CMP processes.The assessment of the Plasmos SD 400 ellipsometer is to be carried out in the production environment of SMST. The result will be a benchmark showing best of breed features: precision, measurement capabilities (e.g. interferometer emulation for thin and thick layers, poly-Si, multilayers, multipurpose), throughput, cost-of-ownership. Programme(s) FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998 Topic(s) 2.9 - Building blocks, methods & tools for semiconductor app&techs Call for proposal Data not available Funding Scheme OIF - Marie Curie actions-Outgoing International Fellowships Coordinator Smst Submicron Semiconductor Technologies EU contribution No data Address Schickardstrasse 25 71004 Boblingen Germany See on map Total cost No data
