Objective The overall goal of OPTIMA is to demonstrate the effectiveness of proximity corrections in a production environment for both memory and logic applications.To develop a commercially available software tool which generates fully automatically a proximity corrected IC design with maximum CD variation due to proximity effects not more than 5% of the target dimension.To produce test masks for proximity parametrisation, demonstration masks for logic and memory applications (total dimension control better than 70 nm), and masks to investigate the resolution limits when applying OPC in combination with other enhancement techniques (total dimension control better than 50 nm).To assess the economical impact of the introduction of OPC taking into account that prices of proximity corrected reticles will be close to those of embedded PSM.Optical lithography is a key technique used in semiconductor manufacturing. Strong efforts are being made worldwide to drive it to its technical limits in order to postpone the inevitable introduction of non-optical techniques. Optical Proximity Correction (OPC) is a novel technique which will make it possible to extend the practical resolution limits of existing exposure tools by at least one technology generation. The necessary OPC tools will be developed and evaluated under OPTIMA. Fields of science natural sciencescomputer and information sciencessoftwarenatural sciencesphysical scienceselectromagnetism and electronicssemiconductivitynatural sciencesphysical scienceselectromagnetism and electronicsmicroelectronics Programme(s) FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998 Topic(s) 2.8 - Semiconductors - Building blocks, methods & tools Call for proposal Data not available Funding Scheme EXC - Marie Curie actions-Chairs Coordinator Nederlandse Philips Bedrijven Bv EU contribution No data Address Prof. Holstlaan 4 5656 AA Eindhoven Netherlands See on map Total cost No data Participants (7) Sort alphabetically Sort by EU Contribution Expand all Collapse all CCLRC Rutherford Appleton Laboratory (RAL) United Kingdom EU contribution No data Address Chilton OX11 0QX Didcot See on map Links Website Opens in new window Total cost No data Compugraphics International Ltd United Kingdom EU contribution No data Address Eastfield Industrial Estate KY7 4NT Glenrothes See on map Total cost No data Grenoble Silicium Submicronique France EU contribution No data Address Avenue Des Martyrs 17 38054 Grenoble 9 See on map Total cost No data Interuniversity Microelectronics Centre Belgium EU contribution No data Address Kapeldreef 75 3001 Leuven See on map Total cost No data SIGMA-C GmbH Germany EU contribution No data Address Rosenheimer Landstraße 74 85521 Ottobrunn See on map Total cost No data STMICROELECTRONICS S.R.L. Italy EU contribution No data Address Via C. Olivetti 2 20041 AGRATE BRIANZA See on map Total cost No data Siemens Ag Germany EU contribution No data Address Balanstrasse 73 D81541 Munich See on map Total cost No data
