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Substrate and barrier layer optimisation for cvd-grown thin-film crystalline silicon solar cells ('SUBARO')

Ziel

A consortium has been formed by partners stemming from research and industry in order to progress towards the development of a cost-effective thin-film crystalline Si technology based on thermally assisted CVD as the deposition technique for the active crystalline Si-layer. The project focuses on three well-defined substrate options: Si-ribbons, conductive ceramics based on infiltrated SiAlON and insulating ceramics based on SiAlON. After the midterm assessment, the most promising conductive, respectively a one-side contacted monolithic module process. The active layers for these devices will be grown in a specifically developed continuous high-throughput CVD-reactor.

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INTERUNIVERSITAIR MIKRO-ELEKTRONICA CENTRUM VZW
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Kapeldreef 75
3001 Heverlee
Belgien

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