Obiettivo Foreseen ResultsThe proposed technique involves the use of a repetitive laser-plasma x-ray source and detection of fluorescence radiation by advanced multilayer mirror analyzers. High sensitivity down to 0; 1 ppm and resolution are achieved due to a high excitation beam intensity on the sample and advanced multilayer optics for efficient spectral analysis of the fluorescence radiation.Using this approach it is expected to meet the high specifications to the surface impurity analysis set by microelectronics industry; thereby promoting table-top; low-cost materials analysis.X-Ray fluorescence analysis (XRF) stands a long tradition as a powerful analysis technique for materials research. The range of applications spans matured industrial usage in for instance wafer inspection in semiconductor fabrication; as well as exploratory scientific research of new materials like in silicon solar cells. XRF constitutes a non-destructive method for determination of microscopic quantities of elements without the need for extensive sample preparation.Despite this wide spread usage; and a fast growing interest in impurity control in microelectronics and environmental research; two general fields of applications have not yet been assessed successfully.These are :the analysis of light elements with atomic number below 10; including important materials like boron or oxygen; andthe ability to perform measurements with spacial resolution with other x-ray sources than large scale sources like synchrotron radiation facilities.This proposal aims at achieving a novel approach to XRF micro-analysis and pursues two principal interrelated objectives :development of an analysis technique with state-of-the-art characteristics for light elements with atomic number below 10; i.e. to demonstrate trace detection limits on the order of 1pg/cm2 for elements like Li; Be; B; C; N; O and F; and a spatial resolution on the sample of down to 1 mm.to make this XRF micro-analysis suitable for a small scale laboratory and hence accessible to larger group of users from research and industry. Campo scientifico natural sciencesphysical sciencesopticsnatural sciencesphysical scienceselectromagnetism and electronicssemiconductivitynatural sciencesphysical scienceselectromagnetism and electronicsmicroelectronicsnatural scienceschemical sciencesinorganic chemistrymetalloids Programma(i) FP4-INCO - Specific research, technological development and demonstration programme in the field of cooperation with third countries and international organizations, 1994-1998 Argomento(i) 01020701 - Tools, techniques and systems for high quality manufacturing Invito a presentare proposte Data not available Meccanismo di finanziamento CSC - Cost-sharing contracts Coordinatore Stichting voor Fundamenteel Onderzoekder Materie - FOM Contributo UE Nessun dato Indirizzo 14,Edisonbaan 3430 BE Nieuwegein Paesi Bassi Mostra sulla mappa Costo totale Nessun dato Partecipanti (5) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto A.F. Ioffe Physico-Technical Institute - Russian Academy of Sciences Russia Contributo UE Nessun dato Indirizzo 26,Politechnitcheskaya 194021 St Petersburg Mostra sulla mappa Costo totale Nessun dato Czech Technical University Cechia Contributo UE Nessun dato Indirizzo 2,V Holesovickach 180 00 Praha 8 Mostra sulla mappa Costo totale Nessun dato Institute for Physics of Microstructures - Russian Academy of Sciences Russia Contributo UE Nessun dato Indirizzo 46,Ul' Yanova 603600 Nizhny -Novgorod Mostra sulla mappa Costo totale Nessun dato King's College London Regno Unito Contributo UE Nessun dato Indirizzo Strand WC2R 2LS London Mostra sulla mappa Costo totale Nessun dato P.N. Lebedev Physical Institute - Russian Academy of Sciences Russia Contributo UE Nessun dato Indirizzo 53,Leninsky prospect 117924 Moskva Mostra sulla mappa Costo totale Nessun dato
