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IN LINE SIMS

Objectif

The overall objective of ILSIMS is to assess and improve a new industrial in line SIMS: the CAMECA WF. ILSIMS project will lead to the first SIMS equipment for in-line control in integrated circuit manufacturing. Work performed will result on full 300 mm wafer analysis capability, very large sensitivity at high depth resolution, capability of SIMS analysis on patterned wafers. The re-use of monitor wafers will be studied and cross contamination suppressed thanks to specific developed masks. The equipment will have a high degree of automation and friendly software. Reliability and cost of ownership issues will be particularly addressed. A final goal is to make the tool "a must" for the in -processes wafer analysis and attract interest at worldwide level in the SC industry. To achieve the objectives a highly qualified strong international Consortium including two non European SC companies will provide complementary work in close cooperation with the equipment supplier CAMECA and the node ST Microelectronics.

Work description:
The CAMECA IMS WF SIMS will be installed in the IC fabrication facility clean room at ST Microelectronics Crolles, first in the 200 mm area and moved thereafter to the 300 mm facilities. From the very beginning of the project 300 mm processed wafers from the ST microelectronics facility at Meylan will be transferred using special single wafer super clean boxes to prevent undesirable contamination. Besides 300 mm wafers other wafers sizes handling and loading will be possible. The equipment will be extensively used to measure all kinds of wafers and samples from the ST Microelectronics 200 production and 300 mm pilot lines as well as those from SIEMENS, LUCENT and SAMSUNG.

The initial and final target specifications to be monitored are:
-system output
-automation level
-analytical performances (detection limits, sputter rate, depth resolution)
-short and long term repeatability-
full automation
-shape recognition system for automatic test pattern analysis
-friendly software
-reliability issues including MTBF, MTTR and cost of ownership. All these issues will be studied and improvements implemented.

ITR-IRST will contribute with a valuable expertise from an off-line similar SIMS. Cross contamination of monitor and product wafers due to the sputter of the analysed area is an important issue for in process monitoring. It will be the object of particular studies. Necessary further developments will be implemented to achieve re-use of monitor/product wafers in further processing and analysis. The broad spectra of samples that will bring the Consortium partners will allow optimising the equipment performance to satisfy requirements of high demanding potential users. The presence among Consortium partners of four major SC companies-among them two non-European is a high added value that helps CAMECA to improve its already important position among global suppliers for the SC industry. Dissemination with emphasis in User oriented actions constitutes an important goal for the project success.

Milestones:
After extensive evaluations on samples, including the ones obtained from the most advanced CMOS/BICMOS/DRAM process on 300 mm wafers demonstrate:
i) CAMECA IMS WF SIMS has the characteristics and performance to be used for in -line process monitoring in integrated circuit fabrication
ii) complies with reliability requirements in terms of MTBF, MTTR and competitive cost of ownership
iii) Succeed the introduction of CAMECA IMS WF SIMS as a routine equipment for in-line process monitoring in IC fabrication

Champ scientifique

Programme(s)

Thème(s)

Appel à propositions

Data not available

Régime de financement

ACM - Preparatory, accompanying and support measures

Coordinateur

STMICROELECTRONICS SA
Contribution de l’UE
Aucune donnée
Adresse
29 BOULEVARD ROMAIN ROLLAND
92120 MONTROUGE
France

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Dernière mise à jour: 13 Juin 2005

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Permalink: https://cordis.europa.eu/project/id/IST-1999-20199/fr

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