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Advanced lithography using ARF scanner 2

Objective

ALASCA2 aims at making an extensive investigation of the technical and lithographic performance of the first generation ASML PAS5500/900 193nm step-and-scan system for R&D and pilot production. Special attention will be given to the performance of the illumination system and the projection lens, and to the lifetime of optical components. The system will be assessed focusing on the 0.13 µm technology node, where 193 nm lithography may be inserted into semiconductor manufacturing.

Call for proposal

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Coordinator

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
EU contribution
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Address
KAPELDREEF 75
3001 LEUVEN
Belgium

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Total cost
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Participants (9)