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Novel Nano-Template Technology And Its Applications To The Fabrication Of Novel Photonic Devices

Objectif

Nano-templates fabricated from chemically stable, resistant materials provide a flexible basis for a range of fabrication technologies including forming, moulding, imprinting and hot embossing.

The purpose of this proposal is to establish large-area novel nano-forming technologies based on patterning porous anodised alumina (Al2O3) and their application to the fabrication of organic solar cell devices, quantum dot based photonic LEDs/Lasers and photonic crystal structure elements.

The specific aims are
1. To research and develop technologies compatible with semiconductor micro-fabrication technologies for nano-patterning using porous anodised alumina or titania thin films, to form arrays of ultra-small structures;
2. To apply porous anodised alumina nano-masking and nano-imprinting to selective area epitaxial growth, to produce GaN quantum dots of unparalleled size uniformity for enhanced light emitting devices and lasers;
3. To apply anodised nano-templates to the fabrication of novel high-aspect ratio photonic devices by nano-imprint lithography;
4. To apply self-ordered porous alumina nano-templates to the mass market fabrication of two-dimensional and three-dimensional photonic crystal structure devices in semiconductors, dielectrics and polymers.

Meeting each aim will involve a detailed, multi-disciplinary programme of micro-fabrication and materials and device characterisation.

Mots‑clés

Appel à propositions

FP6-2004-IST-NMP-2
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Coordinateur

AIXTRON AG
Contribution de l’UE
Aucune donnée
Adresse
Kackertstrasse 15-17
AACHEN
Allemagne

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Coût total
Aucune donnée

Participants (7)