Objectif The overlay control budget for the 32nm technology node will be approximately 10nm according to the ITRS. The overlay metrology budget is typically 1/10 of the overlay control budget resulting in overlay metrology performance requirements of 1nm. Theoretical considerations show that overlay technology based on scatterometry has inherent advantages, which will allow it to achieve this strict requirement and go beyond it.We have demonstrated a breakthrough scatterometry overlay technology in preliminary proof-of-concept experiments. The results of these studies are promising, and at this early stage position scatterometry as one of the leading contenders for the overlay technology for the 32nm node and beyond. We propose to carry out a thorough and detailed research program with the goal of transforming the promising concept into a well-developed technology, which meets the most strict overlay control requirements of the future.The anticipated outcome of the project is an optimal methodology for a scatterometry overlay tool design, target design and algorithms, which allow overlay control with a significantly improved Total Measurement Uncertainty (TMU) and reduced systematic bias with respect to device structures, on layers fabricated with the most advanced processes and materials.We will achieve this through extensive research in target design including the design and fabrication of a dedicated reticle. Extensive measurements of selected targets will be carried out on both RandD and production wafers. The project will also involve a substantial amount of simulations of the lithography process and of the scatterometry signal.The success of the project will be ensured through a very close collaboration of the leading overlay metrology company worldwide with leading European research institution and semiconductor manufacturer. This consortium will augment the European leadership in the microelectronics industry. Champ scientifique natural sciencesphysical scienceselectromagnetism and electronicssemiconductivitynatural sciencesphysical scienceselectromagnetism and electronicsmicroelectronics Programme(s) FP6-NMP - Nanotechnologies and nanosciences, knowledge-based multifunctional materials and new production processes and devices: thematic priority 3 under the 'Focusing and integrating community research' of the 'Integrating and strengthening the European Research Area' specific programme 2002-2006. Thème(s) Data not available Appel à propositions Data not available Régime de financement STREP - Specific Targeted Research Project Coordinateur KLA-TENCOR CORPORATION (ISRAEL) Contribution de l’UE Aucune donnée Adresse 4 HATIKSHORET ST. 23100 MIGDAL HAEMEK Israël Voir sur la carte Coût total Aucune donnée Participants (3) Trier par ordre alphabétique Trier par contribution de l’UE Tout développer Tout réduire INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW Belgique Contribution de l’UE Aucune donnée Adresse KAPELDREEF 75 LEUVEN Voir sur la carte Coût total Aucune donnée QWED SP. Z O.O. Pologne Contribution de l’UE Aucune donnée Adresse UL.ZWYCIEZCOW 34 / 2 03-938 WARSAW Voir sur la carte Coût total Aucune donnée STMICROELECTRONICS S.R.L. Italie Contribution de l’UE Aucune donnée Adresse VIA OLIVETTI 2 20041 AGRATE BRIANZA Voir sur la carte Coût total Aucune donnée
