Obiettivo The growing pressure on manufacturers to obtain high yields from their wafer fabrication operations is leading a trend towards single wafer processing. Rapid Thermal Processing (RTP) has come to be viewed as the single wafer alternative to furnace tube processing. The project aimed to develop a multichamber RTP machine with improved control of the on-wafer temperature and including novel microwave-enhanced techniques for precleaning before oxidation or deposition processes. The growing pressure on manufacturers to obtain high yields from their wafer fabrication operations is leading a trend towards single wafer processing. Rapid thermal processing (RTP) has come to be viewed as the single wafer alternative to furnace tube processing. The project aims at developing a multichamber RTP machine with improved control of the onwafer temperature and including novel microwave enhanced techniques for precleaning before oxidation or deposition processes.The principal technical tasks of this project involved: the identification of the requirement put on RTP for very large scale integration (VLSI) application specific integrated circuit (ASIC), development of the RTP techniques and processes including precleaning, dielectric and polysilicon deposition and the evaluation of the new multichamber RTP machine in an industrial environment.Several results have been demonstrated concerning: process simulation, process characterization and optimization on existing experimental reactor, temperature measurement and emissivity control and specification of the industrial automatic multichamber machine. Such equipment was expected to give high yields in high temperature processes. Because of its greater flexibility, it is expected to be an important production tool for low volume and fast turnaround ASIC.The principal technical tasks of this project involved: - the identification of the requirement put on RTP for VLSI ASIC - development of the RTP techniques and processes including precleaning, dielectric and polysilicon deposition - evaluation of the new multichamber RTP machine in an industrial environment. Campo scientifico natural scienceschemical scienceselectrochemistryelectrolysis Programma(i) FP2-ESPRIT 2 - European strategic programme (EEC) for research and development in information technologies (ESPRIT), 1987-1992 Argomento(i) Data not available Invito a presentare proposte Data not available Meccanismo di finanziamento Data not available Coordinatore SITESA ADDAX Contributo UE Nessun dato Indirizzo RUE DU PRE MILLIET 38330 MONTBONNOT Francia Mostra sulla mappa Costo totale Nessun dato Partecipanti (3) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto Centre National de la Recherche Scientifique (CNRS) Francia Contributo UE Nessun dato Indirizzo 7 avenue de Colonel Roche 31077 Toulouse Mostra sulla mappa Costo totale Nessun dato Commissariat à l'Energie Atomique (CEA) Francia Contributo UE Nessun dato Indirizzo Centre d'Études de Grenoble 17 avenue des Martyrs 38041 Grenoble Mostra sulla mappa Costo totale Nessun dato SGS Thomson Microelectronics SA Francia Contributo UE Nessun dato Indirizzo 17 avenue des Martyrs 38340 Grenoble Mostra sulla mappa Costo totale Nessun dato
