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MAGIC

Project ID: 214945
Funded under

MAsk less lithoGraphy for IC manufacturing (MAGIC)

From 2008-01-01 to 2010-12-31, closed project | MAGIC Website

Project details

Total cost:

EUR 16 694 010

EU contribution:

EUR 11 749 999

Coordinated in:

France

Call for proposal:

FP7-ICT-2007-1See other projects for this call

Funding scheme:

CP - Collaborative project (generic)

Description

MAGIC has supported the development of e-beam based maskless lithography technology in Europe: Two parallel lithography tool developments for 32nm CMOS and beyond and on lithography infrastructure.

In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now driving solution to deal with all industry concerns. Nevertheless, this solution becomes less effective for each new technology node. Effectively, it requires more and more complex and expensive masks due to the introduction of optical proximity correction and phase shift techniques. The blow up of the tool prices play also an important role in the overall cost of ownership of this technique. This trend opens opportunity for the Mask-Less Lithography (ML2) technology, based on multi-beam principles and developped by the two European companies MAPPER and IMS Nanofabrication AG. The cost effective model of the ML2 option in association with the high resolution capability of the electron beam lithography and a reasonable throughput target represents an attractive alternative for lithography and is supported by some key CMOS manufacturers around the world, like TSMC, STMicroelectronics, QIMONDA, TOSHIBA, and Texas Instruments.

This project proposes to support the development of ML2 technology in Europe. It is composed of two linked poles. The first one will be focused on MAPPER and IMMS-NANO tools developments with the objective to deliver a first ML2 alpha platform compatible with 32 nm half pitch technology before 2010, aligned with the semiconductor manufacturer requirements. In relation with this activity, the program will develop the required infrastructure for the usage of this tools in an industrial environment. Among the tasks to be addressed, there is a delivery of a reliable software platform to treat the data base preparation and to provide solutions for ML2 related electron proximity effects. The last concern of this project will be to demonstrate the ability to integrate CMOS processes in real manufacturing conditions on the ML2 platform developpeed by the tool partners.

Objective

In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now the driving solution to deal with all industry concerns. Nevertheless, this solution becomes less effective for each new technology node. Effectively, it requires more and more complex and expensive masks due to the introduction of optical proximity correction and phase shift techniques. The blow up of the tool price plays also an important role in the overall cost of ownership of this technique. This trend opens opportunities for the Mask-Less Lithography (ML2) technology, based on multi-beam principles and developed by the two European companies MAPPER and IMS Nanofabrication AG. The cost effective model of the ML2 option in association with the high resolution capability of the electron lithography and a reasonable throughput target represents an attractive alternative for lithography and is supported by some key CMOS manufacturers around the world, like TSMC, STMicroelectronics, QIMONDA, TOSHIBA, and Texas Instruments...
This project proposes to support the development of ML2 technology in Europe. It is composed of two linked poles. The first one will be focused on MAPPER and IMS-NANO tool developments with the objective to deliver a first ML2 alpha platform compatible for 32nm half pitch technology before 2010, aligned with the semiconductor manufacturer requirements. In relation with this activity, the program will develop the required infrastructure for the usage of these tools in an industrial environment. Among the tasks to be addressed, there is the delivery of a reliable software platform to treat the data base preparation and to provide solution for ML2 related electron beam proximity effects. The last concern of this project will be to demonstrate the ability to integrate CMOS processes in real manufacturing conditions on the ML2 platforms developed by the tool partners.

Coordinator

COMMISSARIAT A L ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
France

EU contribution: EUR 1 735 076


Rue des Martyrs 17
38054 Grenoble
France
Activity type: Research Organisations
Administrative contact: Marie-Laure Page
Tel.: +33 4 38 78 27 96
Fax: +33 4 38 78 51 83
E-mail

Participants

IMS NANOFABRICATION AG
Austria

EU contribution: EUR 1 069 782


SCHREYGASSE
1020 WIEN
Austria
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Hans Loeschner
Tel.: +43 1 214 48 94 24
Fax: +43 1 214 48 94 99
E-mail
FACHHOCHSCHULE VORARLBERG GMBH
Austria

EU contribution: EUR 126 544


HOCHSCHULSTRASSE
6850 DORNBIRN
Austria
Activity type: Higher or Secondary Education Establishments
Administrative contact: Johannes Edlinger
Tel.: +4355727927200
Fax: +4355727929501
E-mail
FUJIFILM ELECTRONIC MATERIALS (EUROPE) N. V.
Belgium

EU contribution: EUR 24 543


KEETBERGLAAN 1A, HAVENNUMMER 1061
2070 ZWIJNDRECHT
Belgium
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: EDDY CEELEN
Tel.: +32 3 2500537
Fax: +32 3 2530840
E-mail
DOW CORNING EUROPE SA
Belgium

EU contribution: EUR 0


Rue Jules Bordet Parc Industriel Zone C
7180 SENEFFE
Belgium
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Gerard MARQUET
Tel.: +32 64 88 82 89
Fax: +32 64 88 84 81
E-mail
DELONG INSTRUMENTS AS
Czech Republic

EU contribution: EUR 851 775


PALACKEHO TR.
61200 BRNO
Czech Republic
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Michal Drsticka
Tel.: +420 549123509
Fax: +420 541217976
E-mail
QIMONDA DRESDEN GMBH & CO.OHG
Participation ended
Germany

EU contribution: EUR 199 543


KOENIGSBRUECKER STRASSE 180
01099 DRESDEN
Germany
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Uwe Poepping
Tel.: +493514388-1722
Fax: -441722
E-mail
GLOBALFOUNDRIES Dresden Module One LLC & Co. KG
Germany

EU contribution: EUR 43 113


Wilschdorfer Landstrasse
01109 Dresden
Germany
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Stephan Krueger
Tel.: +49 351 2774590
Fax: +49 351 27794590
E-mail
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V
Germany

EU contribution: EUR 1 856 498


Hansastrasse
80686 MUENCHEN
Germany
Activity type: Research Organisations
Administrative contact: Walter KRAUSE
Tel.: +49 89 12 05 27 13
Fax: +49 89 12 05 75 34
E-mail
INSTITUT FUER MIKROELEKTRONIK STUTTGART
Germany

EU contribution: EUR 1 000 176


ALLMANDRING STRASSE
70569 STUTTGART
Germany
Activity type: Research Organisations
Administrative contact: Manfred Salzmann
Tel.: +49 711 218 55 210
Fax: +49 711 218 55 7210
E-mail
ASELTA NANOGRAPHICS SA
France

EU contribution: EUR 110 892


PARVIS LOUIS NEEL
38000 GRENOBLE
France
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Olivier PENY
Tel.: +33 6 08 67 23 11
E-mail
STMICROELECTRONICS CROLLES 2 SAS
France

EU contribution: EUR 374 943


RUE JEAN MONNET 850
38920 CROLLES
France
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Guilaine BOSC
Tel.: +33 4 76 92 61 66
Fax: +33 4 76 92 58 71
E-mail
SYNOPSYS INTERNATIONAL LIMITED
Ireland

EU contribution: EUR 764 151


BLOCK 1 BLANCHARDSTOWN CORPORATE PARK
15 DUBLIN
Ireland
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Watchorn Charles
Tel.: +353 1 436 8861
Fax: +353 1 436 8862
E-mail
KLA-TENCOR CORPORATION (ISRAEL)
Israel

EU contribution: EUR 194 006


HATIKSHORET ST.
23100 MIGDAL HAEMEK
Israel
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Adrien Davidson
Tel.: +972 4 6449443
Fax: +972 4 644 9450
E-mail
MAPPER LITHOGRAPHY B.V.
Netherlands

EU contribution: EUR 3 398 957


COMPUTERLAAN 15
2628 XK DELFT
Netherlands
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: Wim Hofland
Tel.: +31 15 888 02 53
Fax: +31 15 888 02 51
E-mail
Synopsys Armenia CJSC
Armenia

EU contribution: EUR 0


Arshakunyats
0026 Yerevan
Armenia
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: N/A N/A
Tel.: +00 0 000000
E-mail
SYNOPSYS SWITZERLAND LLC
Switzerland

EU contribution: EUR 0


Thurgauerstrasse
8050 ZURICH
Switzerland
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: N/A N/A
Tel.: +00 0 000000
E-mail
SYNOPSYS GMBH
Germany

EU contribution: EUR 0


KARL HAMMERSCHMIDT STR
85609 ASCHHEIM
Germany
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative contact: N/A N/A
Tel.: +00 0 000000
E-mail
SYNOPSYS NETHERLANDS BV
Netherlands

EU contribution: EUR 0


St. Odgerusstraat 3
6045 ROERMOND
Netherlands
Activity type: Public bodies (excluding Research Organisations and Secondary or Higher Education Establishments)
Administrative contact: N/A N/A
Tel.: +00 0 000000
E-mail
Record Number: 85374 / Last updated on: 2016-04-01