Project description
Next-Generation Nanoelectronics Components and Electronics Integration
Double patterning lithography has been identified as one of the most promising solutions for the 32nm node patterning. This technique refers to a two step process where a first pattern is exposed, developed and sometimes etched and a second pattern is also exposed, developed and transferred on the top of the first one.
For the moment, several issues still need to be addressed for enabling the Double Patterning process in production such as layout decomposition, topography at wafer level, overlay control, Line Edge Roughness and process throughput. For example, the conventional double patterning process requires two different exposure and etching steps which cumbersomely reduce productivity and increase the cost of ownership.
In that perspective, MD3 aims to suppress the additional etching or exposure steps by developing new strategies for double pattering or double exposure. Three novel approaches will be evaluated: dual layer approach, pattern doubling strategy and double exposure technique. Each strategy will be compared to a reference double patterning process in terms of technical performances as well as cost of ownership. This requires some important material development which must be supported by appropriate simulations and patterning evaluation. Moreover, adapted integration schemes must be developed to validate the possibility of a transfer to the industry.
In order to reach its objectives, MD3 will gather a multidisciplinary team of 7 partners with specific skills and strong background in photoresist development, lithography simulation, lithography process development and characterization and etching process development. To have double patterning or double exposure process ready on time for the 32nm production in 2010, this project is planned over 2 years with a total budget of 4.6ME.
Fields of science (EuroSciVoc)
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques. See: The European Science Vocabulary.
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques. See: The European Science Vocabulary.
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Programme(s)
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Multi-annual funding programmes that define the EU’s priorities for research and innovation.
Topic(s)
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Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.
Call for proposal
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Procedure for inviting applicants to submit project proposals, with the aim of receiving EU funding.
FP7-ICT-2007-1
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Funding Scheme
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Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.
Coordinator
75015 Paris
France
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