DELILAProject reference: 027976
Funded under: FP6-IST
Development of Lithography Technology for Nanoscale structuring of materials using Laser beam interference
Total cost:EUR 2 726 434
EU contribution:EUR 1 999 999
Coordinated in:United Kingdom
Funding scheme:STREP - Specific Targeted Research Project
The project "Development of Lithography Technology for Nanoscale Structuring of Materials Using Laser Beam Interference (DELILA)" focuses on researching and developing a new production technology for fabrication of nano structures and devices. In particular, DELILA will enable low cost and large volume production of surface structures and patterns with nanometric resolution.
Industrial end-users are currently discouraged from expanding their nanotechnology-related business activities by either unacceptably high costs or the impossibility to control production processes on a nanometric scale. DELILA will play a key role in realising the full potential of laser interference lithography as current nanofabrication tools are limited to archaic, slow processing rates, or do not achieve a competitive cost-effective strategy.
DELILA is driven by industrial needs to down-scale feature sizes to nano dimensions, lower fabrication costs and efficiently increase throughput, with the following industrial and scientific objectives:
(1)Fundamental exploration of multiple beam interference lithography and its capabilities;
(2)Development of computer software for the analysis of interference of several coherent beams of laser radiation and for the calculation of the results of diffraction of the radiation by periodic structures of different forms;
(3) Development of DELILA system.
The main outcome of the project will be a nano fabrication tool that has the potential to create a breakthrough in nanolithography technology for both 2D and 3D structuring of materials. It is the aim of DELILA to empower interference nanolithography technology with a clear focus on industrial use. The main advantageous features of the DELILA system in fabrication of nano structures and devices are high resolution (better than 40 nm) compared with other optical technologies, and low cost and high efficiency compared with other beam technologies.
CF24 0DE CARDIFF
20009 GUIPUZCOA (S. SEBASTIAN)
603950 NIZHNY NOVGOROD