Cel The objectives of BOLD are to build and test two lithographic systems that will enable the evaluation of high numerical aperture (NA) optics and scan-and-repeat technology with a resolution in the sub-0.3 micron range. A prototype wafer stage optical lithography system with high accuracy and high speed based on novel principles has been realized. A new motor concept has been introduced and is being evaluated, as are new alignment and interferometry systems. The basic design and technology for the step and scan lens have been established, and the effects of a finite laser bandwidth on the lens performance have been calculated. Market requirements for 0.25 micron scanning systems have been considered, and based on this a system outline for a production step and scan system has been drawn up. Simulation is being used to study the effects of the source and illumination characteristics on the overall performance. User inputs are continuously refined and updated, and are considered in the overall planning.Projection systems with very high NA at short wavelengths will be designed and a prototype lens system built. The possibilities of scan-and-repeat and other photocomposition methods will be investigated, with the emphasis placed on accommodating large chip sizes for future ASIC devices. The most critical subsystems (high-precision synchronised wafer and reticle stages) will be built and tested in a laboratory system. System requirements will be provided by a user group, and the resolution and overlay of the new techniques evaluated. Dziedzina nauki natural sciencesphysical sciencesopticslaser physics Program(-y) FP3-ESPRIT 3 - Specific research and technological development programme (EEC) in the field of information technologies, 1990-1994 Temat(-y) Data not available Zaproszenie do składania wniosków Data not available System finansowania Data not available Koordynator ASM LITHOGRAPHY Wkład UE Brak danych Adres MEIERIJWEG 15, 8805 5503 HN VELDHOVEN Niderlandy Zobacz na mapie Koszt całkowity Brak danych Uczestnicy (6) Sortuj alfabetycznie Sortuj według wkładu UE Rozwiń wszystko Zwiń wszystko CARL ZEISS GMBH Niemcy Wkład UE Brak danych Adres CARL-ZEISS-STRAßE 4-54 73447 OBERKOCHEN Zobacz na mapie Koszt całkowity Brak danych Centre National d'Études des Télécommunications (CNET) Francja Wkład UE Brak danych Adres 38-40 rue du Général Leclerc 92131 Issy-les-Moulineaux Zobacz na mapie Koszt całkowity Brak danych Commissariat à l'Energie Atomique (CEA) Francja Wkład UE Brak danych Adres Centre d'Études de Grenoble 17 avenue des Martyrs 38041 Grenoble Zobacz na mapie Koszt całkowity Brak danych Fraunhofer-Gesellschaft zur Förderungder Angewandten Forschung e.V. Niemcy Wkład UE Brak danych Adres Dillenburgerstrasse 14199 Berlin Zobacz na mapie Koszt całkowity Brak danych IBM Deutschland GmbH Niemcy Wkład UE Brak danych Adres Pascalstraße 100 70569 Stuttgart Zobacz na mapie Koszt całkowity Brak danych INTERUNIVERSITAIR MIKROELEKTRONICA CENTRUM Belgia Wkład UE Brak danych Adres KAPELDREEF, 75 3030 HEVERLEE Zobacz na mapie Koszt całkowity Brak danych