Community Research and Development Information Service - CORDIS

FP7 logo

Synaptic

Project reference: 248538
Funded under: FP7-ICT

SYNthesis using Advanced Process Technology Integrated in regular Cells, IPs, architectures, and design platforms [Print to PDF] [Print to RTF]

From 2009-11-02 to 2013-02-01

Project details

Total cost:

EUR 5 410 613

EU contribution:

EUR 3 520 000

Coordinated in:

Italy

Call for proposal:

FP7-ICT-2009-4

Funding scheme:

CP - Collaborative project (generic)

Synaptic project targets the optimisation of manufacturability and the reduction of systematic variations in nanometer technologies

Synaptic project targets the optimisation of manufacturability and the reduction of systematic variations in nanometer technologies through exploitation of regularity at the architectural, structural, and geometrical levels. The project proposes the creation of a methodology and associated suite of design tools which extract regularity at the architectural and structural level and automate the creation of regular compound cells which implement the functionality of the extracted templates.

The cell creation will employ Restricted Design Rules (RDR’s) and other regularity techniques at the geometrical level to maximise manufacturability and reduce systematic variations. Since the majority of designs in the nanometer regime employ some form of embedded SRAM, the project will include a study of the effects of RDR’s on SRAM in terms of performance and manufacturability and the subsequent definition of a set of RDR’s, which allow manufacturability optimisation for logic functions while remaining compatible with SRAM design rules.

To this end, the project has assembled a consortium of leading academic, research and industrial experts with world class experience in regularity approaches at the various levels. The Synaptic consortium is composed of eight leading institutions, including four European technology companies, a European world-leading research institute in the field of nanoeletronics, and three academic institutions, two from Europe and one from Brazil. In order to ensure the successful commercialisation and deployment of the resulting tool suite the consortium includes a European EDA vendor with significant expertise in the field of design optimisation through automated cell creation. This project will enable European industry to play a leading role in the definition of next-generation design methodologies.

Objective

This proposal addresses Objective ICT-2009.3.2: "Design of Semiconductor Components and Electronic Based Miniaturized Systems" by development of "methods and tools to cope with the design challenges in the next generations of technologies" and focuses on the objective "design for manufacturability taking into account increased variability of new processes". The project described in this proposal targets the optimization of manufacturability and the reduction of systematic variations in nanometer technologies through exploitation of regularity at the architectural, structural, and geometrical levels. We propose the creation of a methodology and associated suite of design tools which extract regularity at the architectural and structural level and automate the creation of regular compound cells which implement the functionality of the extracted templates. The cell creation will employ Restricted Design Rules (RDR's) and other regularity techniques at the geometrical level to maximize manufacturability and reduce systematic variations. Since the majority of designs in the nanometer regime employ some form of SRAM the project will include a study of the effects of RDR's on SRAM in terms of performance and manufacturability and the subsequent definition of a set of RDR's which allow manufacturability optimization for logic functions while remaining compatible with SRAM technologies. To this end we have assembled a consortium of European academic, research and industrial experts with world class experience in regularity approaches at the various levels. In order to ensure the successful commercialization and deployment of the resulting tool suite the consortium includes a European EDA vendor with significant expertise in the field of design optimization through automated cell creation. This project will enable European industry to play a leading role in the definition of next generation design methodologies and challenge the US domination in the area of design automation.

Related information

Coordinator

STMICROELECTRONICS SRL
Italy
VIA C.OLIVETTI 2
AGRATE BRIANZA, Italy
Administrative contact: MARIA GRAZIA PODESTA’
Tel.: +39 039 6037255
Fax: +39 039 6035910
E-mail

Participants

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
Belgium
Kapeldreef
LEUVEN, Belgium
Administrative contact: Christine Van Houtven
Tel.: +32 16 281 613
Fax: +32 16 281 214
E-mail
UNIVERSIDADE FEDERAL DO RIO GRANDE DO SUL
Brazil
AVENIDA PAULO GAMA
PORTO ALEGRE, Brazil
Administrative contact: Andre Inacio Reis
Tel.: +55 51 3308 9453
Fax: +55 51 3308 7308
E-mail
UNIVERSITAT POLITECNICA DE CATALUNYA
Spain
Jordi Girona
BARCELONA, Spain
Administrative contact: Mercedes Torrellas
Tel.: +34934017126
Fax: +34934017126
E-mail
THALES SA
France
Rue de Villiers
NEUILLY SUR SEINE, France
Administrative contact: Olivier PREVOTAT
Tel.: +33 1 69415707
Fax: +33 1 69416001
E-mail
POLITECNICO DI MILANO
Italy
PIAZZA LEONARDO DA VINCI
MILANO, Italy
Administrative contact: Fabio Conti
Tel.: +39 02 2399 3431
Fax: +39 02 2399 3437
E-mail
Leading Edge S.N.C. di Vergine Pietro e Woolaway Nigel Robert
Italy
VIA DELLE ATTIVITA
BREMBATE, Italy
Administrative contact: Nigel Woolaway
Tel.: +39 039 690 7288
Fax: +39 039 690 7287
E-mail
Record Number: 93544 / Last updated on: 2014-10-06