Opis projektu Design of semiconductor components and electronic based miniaturised systemsSynaptic project targets the optimisation of manufacturability and the reduction of systematic variations in nanometer technologiesSynaptic project targets the optimisation of manufacturability and the reduction of systematic variations in nanometer technologies through exploitation of regularity at the architectural, structural, and geometrical levels. The project proposes the creation of a methodology and associated suite of design tools which extract regularity at the architectural and structural level and automate the creation of regular compound cells which implement the functionality of the extracted templates.The cell creation will employ Restricted Design Rules (RDR’s) and other regularity techniques at the geometrical level to maximise manufacturability and reduce systematic variations. Since the majority of designs in the nanometer regime employ some form of embedded SRAM, the project will include a study of the effects of RDR’s on SRAM in terms of performance and manufacturability and the subsequent definition of a set of RDR’s, which allow manufacturability optimisation for logic functions while remaining compatible with SRAM design rules.To this end, the project has assembled a consortium of leading academic, research and industrial experts with world class experience in regularity approaches at the various levels. The Synaptic consortium is composed of eight leading institutions, including four European technology companies, a European world-leading research institute in the field of nanoeletronics, and three academic institutions, two from Europe and one from Brazil. In order to ensure the successful commercialisation and deployment of the resulting tool suite the consortium includes a European EDA vendor with significant expertise in the field of design optimisation through automated cell creation. This project will enable European industry to play a leading role in the definition of next-generation design methodologies. Pokaż cel projektu Ukryj cel projektu This proposal addresses Objective ICT-2009.3.2: "Design of Semiconductor Components and Electronic Based Miniaturized Systems" by development of "methods and tools to cope with the design challenges in the next generations of technologies" and focuses on the objective "design for manufacturability taking into account increased variability of new processes". The project described in this proposal targets the optimization of manufacturability and the reduction of systematic variations in nanometer technologies through exploitation of regularity at the architectural, structural, and geometrical levels. We propose the creation of a methodology and associated suite of design tools which extract regularity at the architectural and structural level and automate the creation of regular compound cells which implement the functionality of the extracted templates. The cell creation will employ Restricted Design Rules (RDR's) and other regularity techniques at the geometrical level to maximize manufacturability and reduce systematic variations. Since the majority of designs in the nanometer regime employ some form of SRAM the project will include a study of the effects of RDR's on SRAM in terms of performance and manufacturability and the subsequent definition of a set of RDR's which allow manufacturability optimization for logic functions while remaining compatible with SRAM technologies. To this end we have assembled a consortium of European academic, research and industrial experts with world class experience in regularity approaches at the various levels. In order to ensure the successful commercialization and deployment of the resulting tool suite the consortium includes a European EDA vendor with significant expertise in the field of design optimization through automated cell creation. This project will enable European industry to play a leading role in the definition of next generation design methodologies and challenge the US domination in the area of design automation. Dziedzina nauki social sciencessociologyindustrial relationsautomationnatural sciencesphysical scienceselectromagnetism and electronicssemiconductivity Program(-y) FP7-ICT - Specific Programme "Cooperation": Information and communication technologies Temat(-y) ICT-2009.3.2 - Design of semiconductor components and electronic based miniaturised systems Zaproszenie do składania wniosków FP7-ICT-2009-4 Zobacz inne projekty w ramach tego zaproszenia System finansowania CP - Collaborative project (generic) Koordynator STMICROELECTRONICS SRL Wkład UE € 773 295,00 Adres VIA C.OLIVETTI 2 20864 Agrate Brianza Włochy Zobacz na mapie Region Nord-Ovest Lombardia Monza e della Brianza Rodzaj działalności Private for-profit entities (excluding Higher or Secondary Education Establishments) Kontakt administracyjny MARIA GRAZIA PODESTA' (Dr.) Linki Kontakt z organizacją Opens in new window Strona internetowa Opens in new window Koszt całkowity Brak danych Uczestnicy (7) Sortuj alfabetycznie Sortuj według wkładu UE Rozwiń wszystko Zwiń wszystko INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM Belgia Wkład UE € 375 661,00 Adres KAPELDREEF 75 3001 Leuven Zobacz na mapie Region Vlaams Gewest Prov. Vlaams-Brabant Arr. Leuven Rodzaj działalności Research Organisations Kontakt administracyjny Christine Van Houtven (Mrs.) Linki Kontakt z organizacją Opens in new window Strona internetowa Opens in new window Koszt całkowity Brak danych UNIVERSIDADE FEDERAL DO RIO GRANDE DO SUL Brazylia Wkład UE € 218 020,00 Adres AVENIDA PAULO GAMA 110 90046900 Porto Alegre Zobacz na mapie Rodzaj działalności Higher or Secondary Education Establishments Kontakt administracyjny Andre Inacio Reis (Prof.) Linki Kontakt z organizacją Opens in new window Strona internetowa Opens in new window Koszt całkowity Brak danych NANGATE AS Zakończenie uczestnictwa Dania Wkład UE € 848 603,00 Adres SMEDEHOLM 2730 HERLEV Zobacz na mapie Rodzaj działalności Private for-profit entities (excluding Higher or Secondary Education Establishments) Kontakt administracyjny Andersen Martin Elhøj (Mr.) Linki Kontakt z organizacją Opens in new window Koszt całkowity Brak danych UNIVERSITAT POLITECNICA DE CATALUNYA Hiszpania Wkład UE € 336 168,00 Adres CALLE JORDI GIRONA 31 08034 Barcelona Zobacz na mapie Region Este Cataluña Barcelona Rodzaj działalności Higher or Secondary Education Establishments Kontakt administracyjny Mercedes Torrellas (Mrs.) Linki Kontakt z organizacją Opens in new window Strona internetowa Opens in new window Koszt całkowity Brak danych THALES Francja Wkład UE € 402 515,00 Adres 4 RUE DE LA VERRERIE 92190 MEUDON Zobacz na mapie Region Ile-de-France Ile-de-France Hauts-de-Seine Rodzaj działalności Private for-profit entities (excluding Higher or Secondary Education Establishments) Kontakt administracyjny Olivier PREVOTAT (Mr.) Linki Kontakt z organizacją Opens in new window Strona internetowa Opens in new window Koszt całkowity Brak danych POLITECNICO DI MILANO Włochy Wkład UE € 440 263,00 Adres PIAZZA LEONARDO DA VINCI 32 20133 Milano Zobacz na mapie Region Nord-Ovest Lombardia Milano Rodzaj działalności Higher or Secondary Education Establishments Kontakt administracyjny Fabio Conti (Mr.) Linki Kontakt z organizacją Opens in new window Strona internetowa Opens in new window Koszt całkowity Brak danych Leading Edge S.N.C. di Vergine Pietro e Woolaway Nigel Robert Włochy Wkład UE € 125 475,00 Adres VIA DELLE ATTIVITA 24041 BREMBATE Zobacz na mapie Rodzaj działalności Private for-profit entities (excluding Higher or Secondary Education Establishments) Kontakt administracyjny Nigel Woolaway (Mr.) Linki Kontakt z organizacją Opens in new window Koszt całkowity Brak danych