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FP6

Final Report - PI-OXIDE (Photonic integrated devices in activated amorphous and crystalline oxides)

Funded under: FP6-IST

Abstract

Scientists in Europe have pooled their expertise and ideas to develop optical devices combining passive and active functions on a single chip. To achieve this goal, various host materials like amorphous and crystalline oxides were employed. Besides the feasibility of applying rare earth ion-doped oxide materials, the potential of high vacuum chemical vapour deposition (HV-CVD) has also been proven.

The first results of integrated on-chip light generation and amplification are part of the PI-OXIDE (Photonic integrated devices in activated amorphous and crystalline oxides) project. The funding was provided in part by the European Commission through its Sixth Framework Programme.

This final activity report provides a brief overview of the research work carried out during the PI-OXIDE project which was organised into seven work packages. Deposition and etching technologies were developed and optimised in work packages 1-6. The final demonstrator was designed and tested in work package 7.

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