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FP6

Final Report - REALISE (Rare Earth Oxide Atomic Layer Deposition for Innovation in Electronics)

Funded under: FP6-NMP

Abstract

This is the final report for the 'Rare earth oxide atomic layer deposition for innovation in electronics' (Realise) which aimed to (i) deposit high permittivity rare earth oxide layers with sub-nanometer control and (ii) integrate these into innovative memory and communications devices.

The report provides a summary of all objectives accomplished. The emphasis is on materials integration for high-volume production of consumer electronics devices, consistent with the IST and NMP objectives of the European Framework Programmes

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