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FP6

Final Report - 3DNANOPRINT (Nanoimprint Lithography for Novel 2- and 3- dimensional Nanostructures)

Project ID: 512667
Funded under: FP6-SME

Abstract

This is the final activity report of 3DNANOPRINT, a project aimed at the development of a complete process technology with the necessary tools to produce three-dimensional (3D) nanostructures with ultra high precision. In comparison to deep or extreme ultra violet lithography, this research paved the way for the widespread use of a nanoscale production technology also by smaller companies, since the investment costs of nanoimprint production lines are significantly less than the ones for DUV or EUV lithography.

The project consisted of two levels, a directly process oriented part dealing with nanoimprint lithography itself, nanoimprint resists, reactive ion etching and alignment problems and a second more application oriented part. In the second part requirements for nanoimprint lithography as production tool are defined, assuring that the final result of the project is a cost effective, high throughput, ultra-precise tool for the production of 3D nanostructures.

This document provides a summary of the overall project objectives and an overview of the work performed and several important achievements made during the project including:
- Moiré alignment;
- mr-UVCur06;
- UV-NIL with quartz stamps on spin coated substrates;
- NIL for glass scales and discs;
- laser assisted NIL prototype process;
- UV Embossing for micro- / nano-optics;
- improvements to the equipment used within the project;
- 3D photonic crystal capability.

Download application/zip (709679)

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