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Abstract

The accuracy with which European metrology laboratories can measure photomask linewidths for the microelectronics industry has been evaluated by a measurement audit. This report describes the techniques that can be used and discusses the performance of those techniques actually employed in the exercise. The achievement of accuracies of a few hundredths of a micron in the measurement of linewidths down to below 1 micron is demonstrated, and the necessary measurement practice and precautions described.

Additional information

Authors: DOWNS M J, National Physical Laboratory, Teddington, Middlesex (GB);TURNER N P, National Physical Laboratory, Teddington, Middlesex (GB)
Bibliographic Reference: EUR 12179 EN (1989) MF, 38 pp., ECU 4, blow-up copy ECU 5
Availability: (2)
ISBN: CD-NA-12179-EN-C
Record Number: 198910784 / Last updated on: 1994-12-01
Category: PUBLICATION
Original language: en
Available languages: en