Inter-comparison of line-width measurements
The accuracy with which European metrology laboratories can measure photomask linewidths for the microelectronics industry has been evaluated by a measurement audit. This report describes the techniques that can be used and discusses the performance of those techniques actually employed in the exercise. The achievement of accuracies of a few hundredths of a micron in the measurement of linewidths down to below 1 micron is demonstrated, and the necessary measurement practice and precautions described.
Bibliographic Reference: EUR 12179 EN (1989) MF, 38 pp., ECU 4, blow-up copy ECU 5
Record Number: 198910784 / Last updated on: 1994-12-01
Original language: en
Available languages: en