TANTALUM PENTOXIDE ON TANTALUM FOIL
An anodically grown tantalum pentoxide on tantalum layer structure reference material has been developed for use as a calibrant for depth resolution and etch rate in compositional depth profiling using Auger electron spectroscopy (AES) or X-ray photoelectron spectroscopy (XPS). Two materials are provided, with nominal oxide thicknesses of 30 nm and 100 nm. This report gives details of the layer thicknesses, interface widths and sputtering yields to test the reference procedure.
Bibliographic Reference: EUR 8839 EN (1984) FS, 73 P., BFR 200, EUROFFICE, LUXEMBOURG POB 1003
Availability: Can be ordered online
Record Number: 1989122027300 / Last updated on: 1987-01-01
Available languages: en