RADIATION DAMAGE IN SILICA BASED GLASSES - POINT DEFECTS, MICROSTRUCTURAL CHANGES AND POSSIBLE IMPLICATIONS ON LEACHING AND CORROSION
The results of recent measurements of optical absorption, etching rate and electron microscopy in pure silica and in borosilicate glasses after irradiation with particles of different mass and energy are reported and discussed. To correlate the atomic defects introduced or modified by irradiation with the variation of macroscopic quantities related with structural stability of glasses. Optical density and etching rates have been measured in silica samples irradiated with heavy ions, both immediately after irradiation and after annealing at various temperatures. The annealing of etching rate does not apparently correlate to the annealing of any band present in UV range, however a correlation with annealing of the so called E'-1 precursor introduced by displacive irradiation and discussed in previous paper seems to be possible. The role of oxygen-vacancies, oxygen excess centers (interstitial or nonbonding oxygens) in the interpretation of our results will be discussed. Changes in the local double bonding of oxygen in the SiO-2 structure are also introduced by the addition of highly mobile alkali metals such as sodium. The effects of various Na concentrations (2,5, 11, 18,5 at %) to the formation and growing of bubbles in borosilicate have been investigated under electron irradiation using H.V. electron microscopy.
Bibliographic Reference: SECOND INTERNATIONAL CONFERENCE ON RADIATION EFFECTS IN INSULATORS, ALBUQUERQUE (NEW MEXICO), MAY 30-JUNE 3, 1983, AND: NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCHB1 (1984), PP. 475-480
Record Number: 1989122066400 / Last updated on: 1987-01-01
Available languages: en