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Résumé

The aim of the present work was to develop a cost effective process for solar cell manufacturing. Dry etching and screen printing techniques have been investigated. Plasma etching was used for surface sawing damage removal, edge leakage current reduction (ring edging) and selective oxide etching. Diffusion from screen printed doping layers has been employed in the preparation of single step and two step structures. The preliminary application of the above techniques to semicrystalline material has been carried out. An economical analysis showed that some of the investigated processes are ready to be used by solar cell manufacturers.

Informations supplémentaires

Auteurs: LOUBLY P, PHOTOWATT INTERNATIONAL S.A., CAEN (FRANCE);AUBRIL P PHOTOWATT INTERNATIONAL S.A., CAEN (FRANCE), PHOTOWATT INTERNATIONAL S.A., CAEN (FRANCE)
Références bibliographiques: EUR 9929 FR (1985) MF, 97 P., BFR 150, BLOW-UP COPY BFR 485, EUROFFICE, LUXEMBOURG, POB 1003
Disponibilité: Can be ordered online
Numéro d'enregistrement: 1989124067200 / Dernière mise à jour le: 1987-01-01
Catégorie: publication
Langues disponibles: fr