SELF-SPUTTERING AND REFLECTION
Self-sputtering and reflection are investigated with the Monte Carlo program TRIMSP. The results include particle and energy reflection coefficients, sputtering yields and sputtered energy versus incident angle and energy. Angular and energy distributions of reflected and sputtered particles are also given. Reflection and sputtering values are compared to show their contributions to self-sputtering. A comparison of calculated sputtering yields and sputtering efficiencies (sputtered and reflected energy) with experimental data is carried out. The systems investigated are mainly the bombardment of C, Ni, and W with self-ions at low energies. All global results are summarized in graphs, where scaling properties are utilized including the sputtering yield in a generalized form.
Bibliographic Reference: ZEITSCHRIFT FUER PHYSIK B - CONDENSED MATTER, VOL. 63 (1986), PP. 109-120
Record Number: 1989125033900 / Last updated on: 1987-03-01
Available languages: en