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Abstract

Sputtered neutral mass spectrometry is shown to be a very sensitive, depth-differential technique for the analysis of helium in solids. Detection limits in nickel are some 10 ppm for near-surface He distributions and can be lowered to a few ppm if extreme depth resolution is not important. Range parameters of 4-He in Ni and Si agree very well with theoretical data. Quantitative evaluation of He concentrations with an accuracy of 4% can be done by producing an internal standard via in situ ion implantation.

Additional information

Authors: GNASER H, KERNFORSCHUNGSANLAGE JUELICH GMBH (GERMANY);BAY H L, KERNFORSCHUNGSANLAGE JUELICH GMBH (GERMANY);HOFER W O KERNFORSCHUNGSANLAGE JUELICH GMBH (GERMANY), KERNFORSCHUNGSANLAGE JUELICH GMBH (GERMANY)
Bibliographic Reference: J. VAC. SCI. TECHNOL. VOL. A5 (1987), NO. 4, PP. 1194-1197
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