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Abstract

A deceleration system for a parallel ion beam in the energy range of 50 to 500 eV is described. The system is used for sputtering yield measurements as a function of the angle of ion incidence. Measured yield data for Cu and Au sputtered by 100- and 300-eV D"+" ions are reported and compared to computer calculations. Experimental and calculated data shows only a weak dependence on the angle of incidence. However, at glancing incidence the experimental values are larger up to a factor of two compared to the calculated ones. This is attributed to the surface roughness not included in the calculations.

Additional information

Authors: LIEBL H, IPP, D;BOHDANSKY J, IPP, D;ROTH J, IPP, D;DOSE V IPP, D, IPP, D
Bibliographic Reference: REVIEW OF SCIENTIFIC INSTRUMENTS, VOL. 58, NO. 10, PP 1830-1832, 1987
Record Number: 1989126071400 / Last updated on: 1989-05-01
Category: PUBLICATION
Available languages: en
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