Community Research and Development Information Service - CORDIS

Abstract

ION BEAM ANALYTICAL RESULTS OF HIGH ACCURACY WERE ACHIEVED BY EMPLOYING AN INTERNAL STANDARD TECHNIQUE FOR NORMALISATION OF THE MEASUREMENTS, MAINLY RBS EXPERIMENTS AT TO THE SI UNIT OF MASS. IT IS APPLIED IN THE CHARACTERISATION OF REFERENCE MATERIAL FOR SURFACE ANALYSIS METHODS SUCH AS RBS, SIMS OR AES. THIN LAYERS OF APPROXIMATELY 10 MICROGRAMME/CM2 THICKNESS ARE ULTRAHIGH VACU EVAPORATED ONTO THE MATERIAL TO BE CHARACTERISED BY ION BEAM ANALYSIS. THE SUBSTRATE SUPPORT IS ROTATING DURING EVAPORATION IN ORDER TO MINIMISE LOCAL THICKNESS VARIATIONS. THE ACCURATE THICKNESS OF THE LAYERS, AVERAGED OVER THE TOTAL EVAPORATED AREA, IS DETERMINED TO WITHIN 0.07 MICROGRAMME/CM2 ABSOLUTE UNCERTAINTY BY USING AN ULTRAHIGH VA - WITH THE SUBSTITUTION PRINCIPLE OF WEIGHING APPLIED. BY XRF OR RBS MEASUREMENTS THE LATERAL UNIFORMITY OF THE LAYERS CAN BE TESTED. TAKING ACCOUNT OF THAT UNIFORMITY WITH RESPECT TO THE BEAM SPOT SIZE IN ION BEAM EXPERIMENTS, THE LOCAL LAYER THICKNESS CAN BE DETERMINED WITH <1.5% RELATIVE UNCERTAINTY. EMPLOYING THE INTERNAL STANDARD TECHNIQUE IN RBS, THE DETERMINATION OF AN ABSOLUTE AMOUNT OF EG IMPLANTED ATOMS REDUCES TO A SIGNAL FROM THE ACCURATELY KNOWN INTERNAL STANDARD, ELIMINATING ALL EXPERIMENTAL UNCERTAINTIES IN THE ABSOLUTE DETECTOR SOLID ANGLE AND ESPECIALLY IN THE ION CURRENT MEASUREMENT AND CHARGE INTEGRATION. EXAMPLES OF APPLICATION TO IMPLANTED REFERENCE MATERIALS OF BI AND AS IN SILICIUM ARE PRESENTED.

Additional information

Authors: WATJEN U JRC-GEEL, JRC-GEEL
Bibliographic Reference: PAPER PRESENTED: INTERNATIONAL CONFERENCE ON APPLICATIONS OF NUCLEAR TECHNIQUES, CRETE/GR, JUNE 26, JULY 2, 1988, AVAILABILITY: CEC-LUXEMBOURG, DG XIII/A2, BP 1907, MENTIONING PAPER ORA 34061 E
Availability: Can be ordered online
Record Number: 1989126226200 / Last updated on: 1989-04-01
Category: PUBLICATION
Available languages: en