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Abstract

THIS NOTE DESCRIBES DIVERS ASPECTS OF THE TECHNIQUE USED FOR RHENIUM PLATING THE HOT PLATE USED FOR CONTACT IONIZATION OF BARIUM IN A Q-PLASMA SOURCE. THE RHENIUM PLATING OPTIMIZES THE PROBABILITY OF BARIUM IONIZATION. SPECIAL CARE HAS TO BE TAKEN IN ORDER TO DEPOSIT A UNIFORM LAYER OF RHENIUM. FOR THIS PURPOSE A SLOW ROTATION IS GIVEN TO THE PLATE DURING DEPOSITION.

Additional information

Authors: PARIS P J CENTRE DE RECHERCHES EN PHYSIQUE DES PLASMAS, ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE, CH, CENTRE DE RECHERCHES EN PHYSIQUE DES PLASMAS, ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE, CH
Bibliographic Reference: REPORT INT151/88, 1988, AVAILABILITY: CENTRE DE RECHERCHES EN PHYSIQUE DES PLASMAS, ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE, 21 AVENUE DES BAINS, LAUSANNE, CH
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