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Abstract

TiN films of different compositional ratio (N)/(Ti) were prepared by reactive ion beam sputtering at substrate temperatures of 77 and 300 K. The chemical composition, the microstructure, electrical resistivity, residual stress, hardness and Young's modulus were studied as a function of the N(2)/Ar gas flow ratio x at which the films were prepared. Glancing angle X-ray diffractometry indicates a mixed phase of Ti, Ti(2)N, TiN at lower x ratios and of cubic TiN at x > 0.05. From the integrated breadth of the diffraction lines grain size D and strain E were determined to be 150 - 250 A for D and 0.5 to 1.5 % for E. The electrical resistivity shows the usually observed dependence with a minimum of 54 microohm.cm at nearly stoichiometric composition. Hardness values up to 25 GPa and compressive stress values up to 10 GPa were obtained.

Additional information

Authors: BUSCHERT R C, JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE);GIBSON P N, JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE);GISSLER W, JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE);HAUPT J, JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE);MANARA A, JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE);JIANG X, JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE);REICHELT K JRC ISPRA ESTAB. (IT), JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE), JRC ISPRA ESTAB. (IT);KFA, INSTITUT FUER SCHICHT- UND IONENTECHNIK, JUELICH (DE)
Bibliographic Reference: PAPER PRESENTED: THE INTERNATIONAL CONGRESS FOR SURFACE TECHNOLOGY, BERLIN (DE), OCT. 11-13, 1989 AVAILABLE FROM COMMISSION OF THE EUROPEAN COMMUNITIES, DG XIII-C-3, L-2920 LUXEMBOURG AS PAPER EN 35059 ORA
Availability: Can be ordered online
Record Number: 1989128004300 / Last updated on: 1990-04-01
Category: PUBLICATION
Available languages: en