Community Research and Development Information Service - CORDIS

Abstract

The accuracy with which European metrology laboratories can measure photomask linewidths for the microelectronics industry has been evaluated by a measurement audit. This report describes the techniques that can be used and discusses the performance of those techniques actually employed in the exercise. The achievement of accuracies of a few hundredths of a micrometre in the measurement of linewidths down to below 1 micron is demonstrated, and the necessary measurement practice and precautions described.

Additional information

Authors: CEC CEC BRUXELLES (BE), CEC BRUXELLES (BE)
Bibliographic Reference: EUR 12242 EN (1990) 37 PP., MF, ECU 4 AVAILABLE FROM THE OFFICE FOR OFFICIAL PUBLICATIONS OF THE EUROPEAN COMMUNITIES, L-2985 LUXEMBOURG
Availability: Can be ordered online
Record Number: 1989128016600 / Last updated on: 1990-11-09
Category: PUBLICATION
Available languages: en