Community Research and Development Information Service - CORDIS

Abstract

Rutherford backscattering spectroscopy and nuclear reaction analysis techniques are used to determine the concentration of oxygen, metals and deuterium in the surface region of collector probes exposed to the plasma discharges in the carbonised TEXTOR fusion device. This paper focuses on time- and space-resolved measurements of oxygen collected during 13 tokamak shots on three cylindrical graphite probes placed near to the plasma boundary. Each probe is exposed to several discharges. Generally, the areal concentration of oxygen is found to be 15-25 times higher than that of metals and about 5-8 times lower than that of trapped deuterium. The influence of ICR heating, plasma density and other plasma parameters upon the deposition rate of oxygen and other species are discussed. The possible chemical state of the deposited oxygen is considered.

Additional information

Authors: RUBEL M, INSTITUT FUER PLASMAPHYSIK, KERNFORSCHUNGSANLAGE JUELICH GMBH, JUELICH (DE);RESEARCH INSTITUTE OF PHYSICS, STOCKHOLM (SE);BERGSAKER H, INSTITUT FUER PLASMAPHYSIK, KERNFORSCHUNGSANLAGE JUELICH GMBH, JUELICH (DE);RESEARCH INSTITUTE OF PHYSICS, STOCKHOLM (SE);EMMOTH B, INSTITUT FUER PLASMAPHYSIK, KERNFORSCHUNGSANLAGE JUELICH GMBH, JUELICH (DE);RESEARCH INSTITUTE OF PHYSICS, STOCKHOLM (SE);WAELBROECK F, INSTITUT FUER PLASMAPHYSIK, KERNFORSCHUNGSANLAGE JUELICH GMBH, JUELICH (DE);RESEARCH INSTITUTE OF PHYSICS, STOCKHOLM (SE);WIENHOLD P INSTITUT FUER PLASMAPHYSIK, KERNFORSCHUNGSANLAGE JUELICH GMBH, JUELICH (DE), INSTITUT FUER PLASMAPHYSIK, KERNFORSCHUNGSANLAGE JUELICH GMBH, JUELICH (DE);RESEARCH INSTITUTE OF PHYSICS, STOCKHOLM (SE);RESEARCH INSTITUTE OF PHYSICS, STOCKHOLM (SE), INSTITUT FUER PLASMAPHYSIK, KERNFORSCHUNGSANLAGE JUELICH GMBH, JUELICH (DE);RESEARCH INSTITUTE OF PHYSICS, STOCKHOLM (SE)
Bibliographic Reference: ARTICLE: JOURNAL OF NUCLEAR MATERIALS, VOL. 161 (1989) PP. 153-163
Record Number: 1989128078300 / Last updated on: 1990-11-09
Category: PUBLICATION
Available languages: en