Intercomparison of line-width measurements - collection of individual reportsFunded under: PRE-BCR 3
The accuracy with which European metrology laboratories can measure photomask linewidths for the microelectronics industry has been evaluated by a measurement audit. This report describes the techniques that can be used and discusses the performance of those techniques actually employed in the exercise. The achievement of accuracies of a few hundredths of a micrometre in the measurement of linewidths down to below 1 micron is demonstrated, and the necessary measurement practice and precautions described.
Bibliographic Reference: EUR 12242 EN (1990) 37 pp., MF, ECU 4
Record Number: 199010178 / Last updated on: 1994-12-01
Original language: en
Available languages: en