Community Research and Development Information Service - CORDIS

Abstract

The accuracy with which European metrology laboratories can measure photomask linewidths for the microelectronics industry has been evaluated by a measurement audit. This report describes the techniques that can be used and discusses the performance of those techniques actually employed in the exercise. The achievement of accuracies of a few hundredths of a micrometre in the measurement of linewidths down to below 1 micron is demonstrated, and the necessary measurement practice and precautions described.

Additional information

Authors: CEC, CEC Bruxelles (BE)
Bibliographic Reference: EUR 12242 EN (1990) 37 pp., MF, ECU 4
Availability: (2)
Record Number: 199010178 / Last updated on: 1994-12-01
Category: PUBLICATION
Original language: en
Available languages: en