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An anodically grown tantalum pentoxide on tantalum layer structure reference material has been developed for use as a calibrant for depth resolution and sputtering rate evaluations in compositional depth profiling, using Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectroscopy. The material may also be used to calibrate nuclear reaction analysis, Rutherford backscattering spectroscopy and elastic recoil detection analysis instruments.

Additional information

Authors: HUNT C P, NPL, Teddington (GB);ORTEGA C, University of Paris VII (FR);DAVID D, University of Compiègne (FR);WEBER G, University of Liège (BE);READ P M, AERE, Harwell (GB);SOFIELD C J, AERE, Harwell (GB);MURRELL M P, AERE, Harwell (GB);JEYNES C, University of Surrey (GB)
Bibliographic Reference: EUR 11345 EN (1990) 189 pp., MF, ECU 8
Availability: (2)
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