Development of a Ta(2)O(5) reference material (collection of individual reports)
An anodically grown tantalum pentoxide on tantalum layer structure reference material has been developed for use as a calibrant for depth resolution and sputtering rate evaluations in compositional depth profiling, using Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectroscopy. The material may also be used to calibrate nuclear reaction analysis, Rutherford backscattering spectroscopy and elastic recoil detection analysis instruments.
Bibliographic Reference: EUR 11345 EN (1990) 189 pp., MF, ECU 8
Record Number: 199010190 / Last updated on: 1994-12-01
Original language: en
Available languages: en