Investigation of preferential sputtering mechanism by analysing the sample surface and near surface region with AES and ISS
Preferential sputtering of compounds and alloys results in a compositional change of the surface and near surface region compared to the bulk composition. This effect can be caused by different mechanisms, and the resulting concentration profiles should be different. For segregation-induced preferential sputtering an enrichment in the outermost layer and a loss in the sublayers of the segregating compound is expected, in contrast to collision dominated systems. The surface of ion-bombarded compounds and alloys is analysed nearly simultaneously with AES (Auger Electron Spectroscopy) and ISS (Ion Scattering Spectroscopy), which have different information depths. The depth distribution of the near surface region is measured by means of sputter depth profiling. Results from collision dominated systems (such as Ta(2)O(5)) are compared with those from systems showing segregation (CuLi). The relevance of the various mechanisms is discussed.
Bibliographic Reference: Article: Materials Modification by High-Fluence Ion Beams, NATO ASI Series E, Vol. 155 (1989) p. 329, text not available
Record Number: 199010580 / Last updated on: 1994-12-01
Original language: en
Available languages: en