Comparative study of TiN(x) films deposited by reactive ion beam sputtering at 77 and 300 K
Comparative studies are performed of the chemical composition, microstructure, residual stress, hardness and Young's modulus of titanium nitride films, prepared by reactive ion beam sputtering at substrate temperatures of 77 and 300 K. The main experimental parameter of sample preparation is the N(2)/Ar gas flow ratio r, which determines the chemical composition of the film [N]/[Ti] and its mechanical and electrical properties. The chemical composition is investigated by AES, XPS and RBS. Microstructural data are obtained by grazing incidence X-ray diffractometry. The measurements indicate a mixed phase of Ti, Ti(2)N, TiN at lower r ratios and of cubic TiN at r > 0.05. From the integrated breadth of the diffraction lines grain size D and strain e are determined to 150 - 250 Å for D and to 0.5 - 1.5 % for e. The residual stress is measured by determining the bending of the substrate. Extraordinarily high compressive stress with pronounced maxima around stoichiometric composition is observed. The microhardness H(v) and Young's modulus E are derived from the indentation loading-unloading curve as measured with a nanoindenter. Values up to 25 GPa for H(v) and to 10 GPa for E are obtained.
Bibliographic Reference: Paper presented: ECASIA 89, Antibes (FR), Oct. 23-27, 1989
Availability: Available from (1) as Paper EN 34919 ORA
Record Number: 199010802 / Last updated on: 1994-12-01
Original language: en
Available languages: en