Effects of ion implantation on the mechanical properties of silicon nitride ceramics
Hot-pressed silicon nitride ceramics with Y(2)O(3) and Al(2)O(3) additives were implanted with inert gas (Ar, N) and metal (Ni, Cr) ions at a broad range of energies (130 keV - 1MeV) and fluences up to 1.0 E17 ions/cm2. Cr-coated Si(3)N(4) was also implanted with inert gas ions. The effect of implantation on the ceramic surface and its mechanical properties have been studied by evaluating the changes in surface topography, flexural strength distribution and microhardness. At high ion fluences (above 1.0 E16/cm2) the surface microhardness was reduced to about 0.75 of that of the unimplanted ceramic, while the volume expanded by 20% as a result of amorphisation. The measured changes in flexural strength were found to depend on the stress-state of the ceramic prior to ion implantation. However, amorphisation and ion mixing of Cr-deposited layers into Si(3)N(4) resulted in a remarkable decrease of the ceramic strength variability.
Bibliographic Reference: Paper presented: 7th CIMTEC World Ceramics Congress, Montecatini Terme (IT), June 24-30, 1990
Availability: Available from (1) as Paper EN 35522 ORA
Record Number: 199011185 / Last updated on: 1994-12-01
Original language: en
Available languages: en