Isotopic exchange in hard amorphous carbonized layers
Hard amorphous films of a-C:H and a-C:D were deposited by an rf glow discharge in either CH(4) or CD(4). By ion bombardment with protons and deuterons, the H/D exchange process was studied as a function of the bombardment fluence by means of depth profile measurements. The local hydrogen and deuterium contents do not add up to a constant "saturation" value and the local mixing model is not valid. Instead, an initial depletion appears, which depends on the incident energy of the ions. At higher fluences, the total (H+D):C ratio tends to increase again, due to an increasing influence of the deposition process. This demonstrates a structural difference between a-C:H films and hydrogen-saturated layers of implanted carbon.
Bibliographic Reference: Article: Journal of Applied Physics, Vol. 67 (1990) No. 1, pp. 163-168
Record Number: 199011420 / Last updated on: 1994-12-02
Original language: en
Available languages: en