X-ray microlithography with a transition radiation source
The purpose of the present experiment is to demonstrate that a feature the size of 0.3 microns can be obtained by using a simple 1:1 proximity printing technique with transition radiation as a source of soft X-rays. This paper presents the results of some test exposures carried out at the end of a series of measurements of X-ray transition radiation at the Saclay linear accelerator. The experimental parameters are not optimised for maximum intensity of the X-ray source.
Bibliographic Reference: Paper presented: International Conference on Microlithography, Louvain (BE), Sept. 18-20, 1990
Availability: Available from (1) as Paper EN 35563 ORA
Record Number: 199011784 / Last updated on: 1994-12-02
Original language: en
Available languages: en