Low temperature deposition of wear and corrosion resistant layers by vacuum assisted processes
The aim of this project was to demonstrate the feasibility of processes which allow a uniform low temperature (below 500 C) deposition of wear and corrosion resistant coatings onto heat sensitive substrates. These substrates were typified by high speed tool steels, other tool steels used in hot and cold metal forming processes and engineering plastics. Low pressure chemical vapour deposition was shown to be a technique suitable for depositing a number of coatings from different organometallic source compounds at temperatures below 500 C. Boron deposited from B(2)H(6) and TiO(2) deposited from Ti[OC(3)H(7)](4) were extensively studied. In plasma chemical vapour deposition, emphasis was placed on the deposition of TiN films on M2 steel substrates. Adhesion of these films could be improved by correct substrate cleaning and in situ discharge pretreatment, or by application of a relatively high DC bias voltage on the substrates during the first 10 minutes of the TiN deposition. An alternative way to deposit TiN films was by sputtering of Ti in an N(2) gas atmosphere. Coatings of 5 micron were typically produced with zone 2 structure and dense morphology having a (200) preferred XRD orientation. Work was performed on the deposition of TiN and W-C composites at temperatures below 250 C on HSS. At even lower temperatures, 150 C, TiN was deposited on aluminium substrates. Maximum thickness of the Ti-TiN layers was 1 micron.
Bibliographic Reference: EUR 13242 EN (1991) 20 pp., MF, ECU 4
Record Number: 199110047 / Last updated on: 1994-12-02
Original language: en
Available languages: en