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This survey covers literature issued since 1965 on plasma chemical vapour deposition (PCVD). It includes part of the literature which is thought to be important for the development of wear and corrosion resistant layers. It deals with equipment and techniques for preparing mainly thin films by means of PCVD, and compounds made by plasma assisted techniques. A division is made between literature published as patents and as research papers. The patent literature is divided between those originating in Japan and in the rest of the world. The less easily available literature is given in the form of re-edited abstracts from the "CHEM. ABS." or the "INSPEC". An index of keywords on compounds is added, as well as a complete list of all authors and co-authors whose papers have been covered in this survey. Also, a list is presented of the patents, the respective companies and inventors. A list of review articles and books concerning plasma assisted deposition is given separately.

Additional information

Authors: SANDERS F H M, Philips Centre for Manufacturing Technology, Eindhoven (NL)
Bibliographic Reference: EUR 13226 EN (1991) 616 pp., MF, ECU 28
Availability: (2)
Record Number: 199110080 / Last updated on: 1994-12-02
Original language: en
Available languages: en
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