Plasma assisted deposition of thin films (discussed at the example of a-C:H)
Coating all inner surfaces of fusion devices with thin carbon films is a very useful means of achieving pure and stable fusion plasmas. The carbon layer suppresses the release of metal atoms by plasma-wall interaction processes, leading to a significant reduction of radiation power from the hot plasma core. The deposition of a-C:H films in fusion devices by rf-assisted dc glow discharges is described, and the observations during film deposition are analysed. The properties of a-C:H type materials are also discussed in detail.
Bibliographic Reference: Extract: Proceedings of the 2nd workshop on Plasma and Laser Technology, Cairo (1990) pp. 213-251
Availability: Forschungszentrum Jülich GmbH (KFA), Jülich (DE)
Record Number: 199110525 / Last updated on: 1994-12-02
Original language: en
Available languages: en