The certification of a reference material for the determination of oxygen in semiconductor silicon by infra-red spectrometry : CRM 369Funded under: FP2-BCR 4
The oxygen content of silicon used for the production of integrated circuits must be accurately known and is, in practice, determined by infra-red spectrometry. This report describes the preparation and the certification of reference samples for the verification of the accuracy of infra-red spectrometers. The material, CRM 369, is available as sets of three samples, covering the range 7-13 microgram/gram oxygen.
Bibliographic Reference: EUR 12928 EN (1991) 54 pp., FS, ECU 6.25
ISBN: ISBN 92-826-2526-5
Record Number: 199110617 / Last updated on: 1994-12-02
Original language: en
Available languages: en