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The oxygen content of silicon used for the production of integrated circuits must be accurately known and is, in practice, determined by infra-red spectrometry. This report describes the preparation and the certification of reference samples for the verification of the accuracy of infra-red spectrometers. The material, CRM 369, is available as sets of three samples, covering the range 7-13 microgram/gram oxygen.

Additional information

Authors: VANDENDRIESSCHE S ET AL., CEC Bruxelles (BE);PAJOT B, Groupe de Physique des Solides de l'Ecole Normale Supérieure, Paris (FR);MURRAY R, University of London, Interdisciplinary Research Centre for Semiconductor Materials, London (GB);GRAFF K, Telefunken Electronic, Heilbronn (DE);STRIJCKMANS K, Instituut voor Nucleaire Wetenschappen, Rijksuniversiteit, Gent (BE)
Bibliographic Reference: EUR 12928 EN (1991) 54 pp., FS, ECU 6.25
Availability: (2)
ISBN: ISBN 92-826-2526-5
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