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Thin boron doped carbonaceous films were deposited on metal alloys (stainless steel, Inconel), graphite and silicon single crystals during the boronisation procedures in TEXTOR. The deposits were investigated by X-ray and electron diffraction, transmission electron microscopy, nuclear reaction and backscattering techniques, electron microprobe and surface analysis techniques combined with ion sputtering (AES, XPS, SNMS). The films show a very good adhesion to all the substrates investigated. They are hard, semitransparent, amorphous and homogeneous down to about 3 nm. Colour-thickness correlation studies give a refractive index about 2.4. The density of the film is approximately 1.2 g/cm3 and the average atomic distance d approximately 0.23 nm. The energy shift of the B(1s) core level in XPS indicates a covalent character of the B-C bond in the deposit. No indication of a B-O bond was found.

Additional information

Authors: VON SEGGERN J ET AL., Institut für Plasmaphysik, Kernforschungsanlage Jülich GmbH, Jülich (DE);GORODETSKY A, Academy of Science, Institute of Physical Chemistry, Moscow (SU);GRASHIN S, I.V. Kurchatov Institute of Atomic Energy, Moscow (SU);GUDOWSKA I, MSI of Physics, Stockholm (SE);ROSS G G, INRS Energie, Varennes, Quebec (CA)
Bibliographic Reference: Article: Journal of Nuclear Materials, Vol. 176 & 177 (1990) pp. 357-362
Record Number: 199110873 / Last updated on: 1994-12-02
Original language: en
Available languages: en
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