Properties of a-C/B:H films relevant to plasma-surface interactions
Thin boron doped carbonaceous films were deposited on metal alloys (stainless steel, Inconel), graphite and silicon single crystals during the boronisation procedures in TEXTOR. The deposits were investigated by X-ray and electron diffraction, transmission electron microscopy, nuclear reaction and backscattering techniques, electron microprobe and surface analysis techniques combined with ion sputtering (AES, XPS, SNMS). The films show a very good adhesion to all the substrates investigated. They are hard, semitransparent, amorphous and homogeneous down to about 3 nm. Colour-thickness correlation studies give a refractive index about 2.4. The density of the film is approximately 1.2 g/cm3 and the average atomic distance d approximately 0.23 nm. The energy shift of the B(1s) core level in XPS indicates a covalent character of the B-C bond in the deposit. No indication of a B-O bond was found.
Bibliographic Reference: Article: Journal of Nuclear Materials, Vol. 176 & 177 (1990) pp. 357-362
Record Number: 199110873 / Last updated on: 1994-12-02
Original language: en
Available languages: en