Borontrimethyl B(CH(3))(3) - A less hazardous substance for boronization
Boronisation, i.e. plasma induced deposition of amorphous boron containing carbon films a-C/B:H on all inner surfaces of fusion devices, has proved to be a powerful conditioning method to achieve very pure fusion plasmas. The use of the highly toxic and explosive gas diborane (B(2)H(6)) in conventional boronisation requires considerable precautions for safe handling. A new technique for boronisation is reported, using less hazardous organic boron compounds, namely borontrimethyl B(CH(3))(3) and borontriethyl B(C(2)H(5))(3). First results indicate that films produced from borontrimethyl have a similar performance in fusion devices to that of layers produced in the conventional way. The new technique thus offers an easier and more convenient method for the boronisation of surfaces.
Bibliographic Reference: Article: Journal of Nuclear Materials, Vol. 176 & 177 (1990) pp. 486-489
Record Number: 199110878 / Last updated on: 1994-12-02
Original language: en
Available languages: en