Influence of the deposition gas on the properties of plasma-deposited carbonized layers
Hard amorphous hydrocarbon films have been deposited by r.f. glow discharges in pure methane, as well as in methane-hydrogen and methane-helium mixtures. Helium or hydrogen addition at constant partial pressure of methane results in an increase of the growth rate in comparison with pure methane. Whereas helium is not incorporated into the film, additional hydrogen uptake is found for hydrogen dilution. Both the film density and the index of refraction can be varied by the use of different gas mixtures. The results are explained qualitatively in terms of ballistic effects resulting from ion bombardment during film growth.
Bibliographic Reference: Article: Surface and Coatings Technology, Vol. 45 (1991) pp. 353-358
Record Number: 199111308 / Last updated on: 1994-12-02
Original language: en
Available languages: en