A system to deposit boron films (boronization) in the DIII-D tokamak
A system has been added to the DIII-D tokamak to coat its plasma facing surfaces with a film of boron using diborane gas. The system includes special health and safety equipment for handling the diborane gas which is toxic and inflammable. The purpose of the boron film is to reduce the levels of impurity atoms in the DIII-D plasmas. Experiments following the application of the boron film in DIII-D have led to significant reductions in plasma impurity levels and the observation of a new, very high confinement regime.
Bibliographic Reference: Report: GA-A20624 EN (1991) 4 pp.
Availability: Available from General Atomics, P.O. Box 85608, San Diego, CA 92186-9784 (US)
Record Number: 199111642 / Last updated on: 1994-12-02
Original language: en
Available languages: en