Ion energy distribution at the substrate in an ECR-reactor
Electron cyclotron resonance (ECR) excited plasmas are especially useful for processes requiring low pressure and low gas temperature, and for the deposition of insulating layers. For the case discussed in this article, the ECR plasma is generated by coupling a circularly polarised microwave (2.45 GHz) into the reaction chamber. Resonance with the electrons gyrating in the overlying magnetic field at 87.5 mT leads to an acceleration of the electrons, which in turn ionise the processing gas. For the deposition of a-C:H and polymer-like hydrocarbon films it has been shown that the impact energy of ions on the substrate has a decisive effect on microstructure and macroscopic properties of the deposited films. The possible control of ion energies by varying the magnetic field configuration makes the ECR plasmas attractive for a-C:H film deposition as it offers the possibility of intentionally altering the film properties. In order to investigate this relationship an ion energy analyser was introduced into the reaction chamber in place of the substrate. Ion energy distributions in carbon and methane under various discharge conditions were measured and the results are discussed in detail.
Bibliographic Reference: Article: Diamond and Diamond-like Films and Coatings (1991) pp. 661-667
Record Number: 199210491 / Last updated on: 1994-12-02
Original language: en
Available languages: en